发明名称 THIN FILM TRANSISTOR AND METHOD FOR PRODUCING THE SAME
摘要 The present invention provides a method of manufacturing a thin film transistor of a top-contact structure with suppressed deterioration by a process which is easy and suitable for increase in area without damaging an organic semiconductor pattern. The organic semiconductor pattern is formed on a substrate. An electrode material film is formed on the substrate so as to cover the organic semiconductor pattern. A resist pattern is formed on the electrode material film. By wet etching using the resist pattern as a mask, the electrode material film is patterned. By the process, a source electrode and a drain electrode are formed.
申请公布号 US2012199836(A1) 申请公布日期 2012.08.09
申请号 US201213448969 申请日期 2012.04.17
申请人 KATSUHARA MAO;YONEYA NOBUHIDE;SONY CORPORATION 发明人 KATSUHARA MAO;YONEYA NOBUHIDE
分类号 H01L51/52;H01L51/10 主分类号 H01L51/52
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