发明名称 COATING SOLUTION FOR FORMATION OF LOW-REFLECTIVE FILM, METHOD FOR PREPARATION THEREOF AND LOW-REFLECTIVE MEMBER PRODUCED BY USING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide a coating solution for forming a low-reflective film on a base material, having a low refractive index and low reflectance in the form of a monolayered film and easily forming a large surface area film in a simpler manner, a method for preparing the coating solution, and a low-reflective member produced by using the coating solution. <P>SOLUTION: The coating solution for forming the low-reflective film on a base material comprises a dispersion liquid containing colloidal silica and &ge;5 mass% and &le;40 mass% of a tungsten compound in terms of oxide based on the amount of colloidal silica. The coating solution uses rod-like colloidal silica having a major diameter of &ge;5 nm and &le;100 nm, spherical colloidal silica having a particle diameter of &ge;5 nm and &le;50 nm, and the tungsten compound. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012148951(A) 申请公布日期 2012.08.09
申请号 JP20110150701 申请日期 2011.07.07
申请人 CENTRAL GLASS CO LTD 发明人 SUGIMOTO TOSHIAKI;TAKANOBU HISAFUMI;HARA IKUNARI
分类号 C03C17/25;B32B9/00;B32B17/10 主分类号 C03C17/25
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