发明名称 SUBSTRATE HEATING APPARATUS, SUBSTRATE HEATING METHOD AND STORAGE MEDIUM
摘要 <P>PROBLEM TO BE SOLVED: To detect whether a micro object of 1 mm or smaller, for example, adhering to the surface of a hot plate has ridden on a substrate or not when the substrate is placed on the hot plate and heated. <P>SOLUTION: With regard to a hot plate 11 for mounting a wafer W, a plurality of heaters 12 are provided so as to be spaced apart from each other in the horizontal direction, and temperature sensors 13 are arranged to correspond with these heaters 12. The wafer W is then mounted on the hot plate 11 set to a set temperature, and the standard deviation is calculated for the temperatures measured by the temperature sensors 13 after the temperature of the hot plate 11 begins to lower due to heat absorption by the wafer W before returning to the set temperature. The standard deviation is compared with a preset threshold. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012151247(A) 申请公布日期 2012.08.09
申请号 JP20110008202 申请日期 2011.01.18
申请人 TOKYO ELECTRON LTD 发明人 MISAKA SHINICHIRO
分类号 H01L21/027 主分类号 H01L21/027
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