INFRARED-REFLECTING SUBSTRATE

摘要

Provided is an infrared-reflecting substrate that can be readily produced by coating the surface of a base material, and that exhibits superior infrared-reflecting performance while also exhibiting high light-transmitting performance at a low film thickness. This infrared-reflecting substrate includes an infrared-reflecting layer formed by coating a transparent base material with a coating agent containing a complex of poly(3,4-disubstituted thiophene) and a polyanion, and exhibits a total light transmittance of 60% or greater. Preferably, the complex exhibits an electroconductivity of 0.15 (S/cm) or greater. Preferably, the infrared-reflecting layer has a film thickness of 0.50 µm or less.