发明名称 LIQUID PROCESSING APPARATUS AND LIQUID PROCESSING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a liquid processing apparatus and a liquid processing method which allow multiple nozzle support arms to move into a processing chamber. <P>SOLUTION: A liquid processing apparatus 10 includes: a processing chamber 20; nozzles 82a for supplying a fluid to a substrate W held by a substrate holding part 21; nozzle support arms 82 supporting the nozzles 82a; and an arm standby part 80 provided adjacent to the processing chamber 20 and used as a place in which the nozzle support arms 82 withdrawn from the processing chamber 20 stand by. In the liquid processing apparatus 10, the multiple nozzle support arms 82p to 82u are provided, and the nozzle support arms 82p, 82r, 82t are positioned at a height different from the nozzle support arms 82q, 82s, 82u. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012151236(A) 申请公布日期 2012.08.09
申请号 JP20110008047 申请日期 2011.01.18
申请人 TOKYO ELECTRON LTD 发明人 TOJIMA JIRO
分类号 H01L21/304;H01L21/027;H01L21/306 主分类号 H01L21/304
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