SYSTEMS AND METHODS FOR FORMING A TIME-AVERAGED LINE IMAGE

摘要

PURPOSE: A system and a method for forming a time-averaged line image are provide to increase wafer throughput by laser annealing a semiconductor wafer to reduce the amount of line-image overlap for adjacent scans of a wafer scan path. CONSTITUTION: A primary laser system(20) emits a primary laser beam(22) along an optical axis(A1) that runs in the Z-direction. A beam conditioning optical system(30) is arranged along the optical axis on the lower part of the laser system. A secondary laser system(50) emits an secondary laser beam(52) along the optical axis. A scanning optical system(60) is arranged along the optical axis on the lower part the secondary laser system. A variable attenuator(56) is arranged between the secondary laser system and the scanning optical system.