| 摘要 |
PURPOSE: A deposition apparatus is provided to prevent impurities from permeating into a substrate mounted on a susceptor lower plate by forming the protrusion on a susceptor upper plate and improving adhesion between the impurities and the susceptor upper plate. CONSTITUTION: A chamber(10) is formed in the shape of a cylinder or a square box. Heating elements(60) are arranged at regular distances to uniformly heat a wafer(50). A heat insulation unit(20) is formed to effectively deliver the hear from the heating element to a susceptor. The susceptor includes a susceptor upper plate(37), a susceptor lower plate(38) and a susceptor side plate. A wafer holder(40) is located on the susceptor lower plate to fix the wafer.
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