发明名称 |
IMAGE PROCESSING-BASED LITHOGRAPHY SYSTEM AND TARGET OBJECT COATING METHOD |
摘要 |
A technique related with a lithography system is disclosed. The lithography system includes at least one target object disposed on a substrate, a processor configured to process an image of the target object to determine an optical pattern for a coating layer of the target object, and an exposure apparatus configured to provide light having the optical pattern determined by the processor to the substrate. |
申请公布号 |
EP2485247(A2) |
申请公布日期 |
2012.08.08 |
申请号 |
EP20100820818 |
申请日期 |
2010.09.29 |
申请人 |
SNU R & DB FOUNDATION |
发明人 |
KWON, SUNG HOON;CHUNG, SUEUN;LEE, SEUNGAH;JANG, JISUNG;HAN, SANGKWON |
分类号 |
H01L21/027;B29C35/08;G03F7/20;G03F9/00;H01L21/66;H01L23/00;H01L33/44 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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