SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

摘要

PURPOSE: A semiconductor element and a manufacturing method thereof are provided to prevent the defect of the semiconductor element due to moisture and gas of an inner film by increasing discharging paths of moisture and gas. CONSTITUTION: A first interlayer insulating film(14) is formed on a substrate(10). A first conductive pattern(20) and a second interlayer insulating film(22) are formed on the first interlayer insulating film. A second conductive pattern(28) is formed on the second interlayer insulating film. A third interlayer insulating film(30) is formed in the gap between the second conductive patterns.