Method and apparatus for manufacturing trichlorosilane

摘要

A method and an apparatus for manufacturing trichlorosilane are disclosed. A polymer containing high boiling chlorosilane compounds that are generated in a polycrystalline silicon manufacturing process are mixed with hydrogen chloride and introduced into a decomposition furnace. The polymer and the hydrogen chloride are reacted at a temperature of 450°C, and preferably between 450°C and 700°C. Preferably a mixture containing the polymer and 10 to 30 mass% of hydrogen chloride with respect to the weight of the polymer is introduced into the decomposition furnace.