发明名称 Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine
摘要 Apparatus and methods keep immersion liquid in a space adjacent to an optical assembly. An optical assembly projects an image onto a substrate supported adjacent to the optical assembly by a substrate table. An insertion member insertable into the space between the optical assembly and the substrate, the substrate table, or both, divides the immersion liquid into a first portion and a second portion, the first portion disposed between the optical assembly and the insertion member, and the second portion disposed between the insertion member and the substrate, the substrate table, or both. The insertion member keeps the optical assembly in contact with the first portion when the substrate is moved away from being disposed adjacent to the optical assembly.
申请公布号 US8237911(B2) 申请公布日期 2012.08.07
申请号 US20070976898 申请日期 2007.10.29
申请人 POON ALEX;KHO LEONARD;KESWANI GAURAV;COON DEREK;NIKON CORPORATION 发明人 POON ALEX;KHO LEONARD;KESWANI GAURAV;COON DEREK
分类号 G03B27/32;G03B27/42;G03B27/52 主分类号 G03B27/32
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