发明名称 Method of making a photovoltaic device or front substrate for use in same with scratch-resistant coating and resulting product
摘要 A method of making an anti-reflection coating using a sol-gel process, for use in a photovoltaic device or the like. The method may include the following steps in certain example embodiments: forming a polymeric component of silica by mixing silane(s) with one or more of a first solvent, a catalyst, and water; forming a silica sol gel by mixing the polymeric component with a colloidal silica, and optionally a second solvent; forming a combined sol by mixing siloxane(s) with the silica sol; casting the mixture by spin coating or the like to form a silica and siloxane containing layer on a substrate; and curing and/or heat treating the layer. This layer may make up all or only part of an anti-reflection coating which may be used in a photovoltaic device or the like.
申请公布号 US8237047(B2) 申请公布日期 2012.08.07
申请号 US20070797214 申请日期 2007.05.01
申请人 SHARMA PRAMOD K.;GUARDIAN INDUSTRIES CORP. 发明人 SHARMA PRAMOD K.
分类号 H01L31/00;B05D5/12 主分类号 H01L31/00
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