发明名称 |
Positive resist composition and method of forming resist pattern |
摘要 |
A positive resist composition including a base component (A) which exhibits increased solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the base component (A) including a polymeric compound (A1) containing a structural unit (a0) represented by general formula (a0-1), a structural unit (a1) derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group, and a structural unit (a3) derived from an acrylate ester containing a hydroxy group-containing aliphatic hydrocarbon group represented by general formula (a3-1), and the amount of the structural unit (a3) based on the combined total of all structural units constituting the polymeric compound (A1) being in the range of 1 to 30 mol %.
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申请公布号 |
US8236477(B2) |
申请公布日期 |
2012.08.07 |
申请号 |
US20090591819 |
申请日期 |
2009.12.02 |
申请人 |
MATSUMIYA TASUKU;SHIONO DAIJU;HIRANO TOMOYUKI;DAZAI TAKAHIRO;ENDO KOTARO;TOKYO OHKA KOGYO CO., LTD. |
发明人 |
MATSUMIYA TASUKU;SHIONO DAIJU;HIRANO TOMOYUKI;DAZAI TAKAHIRO;ENDO KOTARO |
分类号 |
G03F7/039;G03F7/20;G03F7/30 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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