| 摘要 |
PURPOSE: An atmospheric pressure RF plasma treatment device is provided to effectively adjust impedance matching according to an electrode mounted on a plasma head. CONSTITUTION: An atmospheric pressure RF plasma treatment device comprises a gas supply unit(10), a power supply unit(20), a matching unit(30), a matching control unit(40), a plasma head(50), and a plasma nozzle member(60). The gas supply unit supplies inert gas. The power supply unit applies RF power having 10-30MHz band to the plasma head. The matching control unit comprises a controller, a motor, and a power transmission unit. The plasma head forms a gas inlet and is made of an insulator. A plurality of plasma nozzle members generates the plasma discharge of the inert gas and discharges plasma gas.
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