| 摘要 |
PURPOSE: A process-significant data determination method for a vacuum deposition process is provided to minimize an error in determination of process-significant data caused by measuring position and/or spectroscopy. CONSTITUTION: A process-significant data determination method for a vacuum deposition process comprises the steps of: determining three or more intensities of spectrum lines of two or more process materials from light emitting spectrum, determining a first relative intensity from a pair of the intensities based on a first mathematical relation, determining a second relative intensity from another pair of the intensities, and calculating an intensity relation(IV) as process-significant data from the first and second relative intensities.
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