MULTI-GRAY SCALE PHOTOMASK, MANUFACTURING METHOD OF MULTI-GRAY SCALE PHOTOMASK, PATTERN TRANSFER METHOD, AND MANUFACTURING METHOD OF THIN FILM TRANSISTOR

摘要

PURPOSE: A gray-scale photomask is provided to obtain resist pattern with profile at edge portion and improve production stability of TFT. CONSTITUTION: A method for forming gray-scale photomask comprises: a step of forming a first semi-transmission film and second half-transmission film on a transparent substrate (11); a step of patterning; and a step of forming transfer pattern containing light-transmitting part, first half light-transmitting part (12), and second half light-transmitting part.