发明名称 DIVIDED SPUTTERING TARGET AND METHOD FOR PRODUCING SAME
摘要 [Problem] To provide a divided sputtering target obtained by joining a plurality of target members, whereby it is possible to effectively prevent the contamination of grown thin films by the material constituting a backing plate as a result of sputtering. [Solution] The present invention is a divided sputtering target obtained by joining a plurality of target members on a backing plate by low-temperature soldering, characterized in that ceramic material or organic material is filled into gaps formed between the joined target members. Moreover, the ceramic material should preferably be a ceramic powder or ceramic fibers having the same composition as the target member, and it is preferable that the organic material is a substance with high resistance.
申请公布号 KR20120086730(A) 申请公布日期 2012.08.03
申请号 KR20127016052 申请日期 2011.07.13
申请人 MITSUI MINING & SMELTING CO., LTD. 发明人 KUBOTA TAKASHI
分类号 C23C14/34;C04B35/457 主分类号 C23C14/34
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