发明名称 SUBSTRATE PROCESSING DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To improve throughput of sheet/batch mix processing by continuously and efficiently transferring substrates between a sheet processing device and a batch processing device. <P>SOLUTION: In the substrate processing device, a laterally elongated process station 10 is arranged at a system center part, and a loader 12 and an unloader 14 are coupled to both ends in the longitudinal direction (X-direction) of the process station 10. The process station 10 is constituted by a sheet concentration block 10A, a sheet/batch mix block 10B, and a sheet concentration block 10C arranged in the order of a process flow from the loader 12 toward the unloader 14. The intermediate sheet/batch mix block 10B is provided with one or more sheet action electrode deposition units 36, one or more sheet grid wiring deposition units 38, a batch heat processing device 40, and a batch calcination device 42. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012146862(A) 申请公布日期 2012.08.02
申请号 JP20110004968 申请日期 2011.01.13
申请人 TOKYO ELECTRON LTD 发明人 FURUYA GORO;TERADA SHOJI;FUKUDA YOSHITERU;WADA NORIO
分类号 H01L21/677;H01L21/02;H01L31/04;H01M14/00 主分类号 H01L21/677
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