发明名称 |
APPARATUS AND METHOD FOR PRODUCING POLYCRYSTALLINE SILICON HAVING REDUCED AMOUNT OF BORON COMPOUND BY VENTING SYSTEM WITH INERT GAS |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide an apparatus and method for manufacturing polycrystalline silicon having a reduced amount of boron compounds. <P>SOLUTION: The apparatus feeds Ar gas in a trichlorosilane (TCS) line 22, which connects a trichlorosilane (TCS) tank 2a and a series of distillation units 4 to 6. The distillation units 4 to 6 have a pressure transducer 4e to 6e and a pressure independent control valve (PIC-V) 4f to 6f positioned on a vent gas line 26 for discharging vent gas from the distillation units 4 to 6. Ar gas is fed to the TCS line 22 with higher pressure than the pressure set for opening the PIC-V 4f to 6f. The TCS is distilled by the distillation units 4 to 6 with continuously discharging vent gas from the distillation units 4 to 6. <P>COPYRIGHT: (C)2012,JPO&INPIT |
申请公布号 |
JP2012144427(A) |
申请公布日期 |
2012.08.02 |
申请号 |
JP20120000882 |
申请日期 |
2012.01.06 |
申请人 |
MITSUBISHI MATERIALS CORP |
发明人 |
KAMEI TAKESHI;NAKANO MAMORU |
分类号 |
C01B33/039;C01B33/035;C01B33/107 |
主分类号 |
C01B33/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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