发明名称 CHARGED PARTICLE BEAM APPARATUS
摘要 <p>Provided is a method for high-speed neutralizing of charge arising in the area of a sample irradiated by a charged particle beam without providing a new, separate device in a charged particle beam apparatus. At the stage following irradiation by the charged particle beam for measuring the sample and before carrying out the next measurement, the retarding voltage and/or acceleration voltage is adjusted and controlled such that neutralization is accomplished by the difference between the value for the retarding voltage and the value for the acceleration voltage being made less than that during measurements. The charge arising in the area of the sample irradiated by the charged particle beam can be neutralized without providing a separate device in the charged particle beam apparatus; therefore, neutralization is possible without lowering throughput.</p>
申请公布号 WO2012101704(A1) 申请公布日期 2012.08.02
申请号 WO2011JP06672 申请日期 2011.11.30
申请人 HITACHI HIGH-TECHNOLOGIES CORPORATION;MATSUI, HIROYUKI;KOMURO, OSAMU;NISHIHARA, MAKOTO;CHENG, ZHAOHUI 发明人 MATSUI, HIROYUKI;KOMURO, OSAMU;NISHIHARA, MAKOTO;CHENG, ZHAOHUI
分类号 H01J37/20;H01J37/28 主分类号 H01J37/20
代理机构 代理人
主权项
地址