| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a novel resin, a resist composition using the resin, and a method of forming a resist pattern using the resist composition. <P>SOLUTION: The resin for resist includes: a structural unit (a0) shown by general formula (a-0); and a structural unit (a1) derived from an acrylate containing an acid dissociation dissolution-inhibiting group, and is characterized in that alkali-solubility increases by the action of an acid. In the formula (a-0), R denotes a hydrogen atom, a halogen atom, a lower alkyl group or a halogenated lower alkyl group; a is an integer of 0-2; b is an integer of 1-3; c is an integer of 1-2; and a+b is an integer of at least 2. <P>COPYRIGHT: (C)2012,JPO&INPIT |
