| 发明名称 |
RESIN, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition capable of producing a resist pattern with excellent CD uniformity (CDU). <P>SOLUTION: The resin includes a structural unit represented by formula (aa) and a structural unit represented by formula (ab), and the resin composition contains this resin and an acid generator, wherein R<SP POS="POST">aa1</SP>, R<SP POS="POST">ab1</SP>each represent hydrogen atom or methyl; R<SP POS="POST">aa2</SP>represents hydrogen atom or alkyl fluoride group; R<SP POS="POST">aa3</SP>represents alkyl fluoride group; R<SP POS="POST">aa4</SP>represents a monovalent group the bond of which with oxygen atom [O-R<SP POS="POST">aa4</SP>] is never cut by the action of an acid; n<SP POS="POST">aa1</SP>and n<SP POS="POST">ab1</SP>each represent 1 or 2; A<SP POS="POST">aa1</SP>represents hydrocarbon group; A<SP POS="POST">ab1</SP>represents hydrocarbon group or single bond; W<SP POS="POST">1</SP>represents alicyclic hydrocarbon group; A<SP POS="POST">ab2</SP>represents aliphatic hydrocarbon group; and R<SP POS="POST">ab2</SP>represents alkyl fluoride group or the like. <P>COPYRIGHT: (C)2012,JPO&INPIT |
| 申请公布号 |
JP2012144699(A) |
申请公布日期 |
2012.08.02 |
| 申请号 |
JP20110257188 |
申请日期 |
2011.11.25 |
| 申请人 |
SUMITOMO CHEMICAL CO LTD |
发明人 |
ICHIKAWA KOJI;SHIGEMATSU JUNJI;HASHIMOTO KAZUHIKO |
| 分类号 |
C08F220/26;C08F220/22;G03F7/004;G03F7/039;H01L21/027 |
主分类号 |
C08F220/26 |
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