| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a technology advantageous for improving flexibility in setting a shear amount of test light flux. <P>SOLUTION: A shearing interferometer for measuring a wave surface of light from a test optical system comprises: an imaging element; a pupil imaging optical system for forming an image of pupil of the test optical system on an imaging surface of the imaging element; a diffraction grating that is arranged in an optical path of the pupil imaging optical system and forms multiple wave surfaces by dividing the wave surface of light from the test optical system; and a drive mechanism for changing a position of the diffraction grading in a direction parallel to an optical axis of the shearing interferometer so as to change a shear amount on the imaging surface between the wave surfaces divided by the diffraction grating. The imaging element takes an image of interference fringe that is formed by the wave surfaces divided by the diffraction grating. <P>COPYRIGHT: (C)2012,JPO&INPIT |
