发明名称 |
METHOD AND SYSTEM TO PREDICT LITHOGRAPHY FOCUS ERROR USING SIMULATED OR MEASURED TOPOGRAPHY |
摘要 |
A method and system to predict lithography focus error using chip topography data is disclosed. The chip topography data may be measured or simulated topography data. A plane is best fitted to the topography data, and residuals are computed. The residuals are then used to make a prediction regarding the focus error. The density ratio of metal to dielectric may also be used as a factor in determining the predicted focus error. |
申请公布号 |
US2012194792(A1) |
申请公布日期 |
2012.08.02 |
申请号 |
US201113014803 |
申请日期 |
2011.01.27 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
SAPP BRIAN CHRISTOPHER;CHO CHOONGYEUN;CLEVENGER LAWRENCE A.;ECONOMIKOS LAERTIS;LIEGL BERNHARD R.;PETRARCA KEVIN S.;QUON ROGER ALLAN |
分类号 |
G03B27/52 |
主分类号 |
G03B27/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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