| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition dissolved in an organic solvent containing an alcohol solvent, the resist composition allowing formation of a pattern with a fine dimension in a good state, and to provide a method for forming a resist pattern. <P>SOLUTION: A resist composition comprises a base component (A) the solubility of which with a developing solution changes by an action of an acid and an acid generator component (B) generating an acid by exposure, and these components are dissolved in an organic solvent (S). The basic component (A) contains a copolymer (A1) showing an increase in the polarity by an action of an acid. The copolymer (A1) includes the following structural units (a2) uniformly dispersed and disposed within the molecule, the structural units containing a lactone-containing cyclic group and derived from an acrylic acid ester, in which a hydrogen atom bonded to a carbon atom at an α-position may be substituted with a substituent. <P>COPYRIGHT: (C)2012,JPO&INPIT |
