摘要 |
Method for the manufacture of electronic devices with purified fluorine Elemental fluorine is used as etching agent for the manufacture of electronic devices, i.a., semiconductor devices, micro-electromechanical devices, thin film transistors, flat panel displays and solar panels, and as chamber cleaning agent mainly for PECVD apparatus. For this purpose, fluorine often is produced on- site. The invention provides a process for the manufacture of electronic devices wherein fluorine is produced on site and is purified from HF by a low temperature treatment. A pressure of between 1.5 and 20 Bara is especially advantageous. |
申请人 |
SOLVAY SA;SOMMER, CHRISTOPH;DIANA, OLIVIERO;EICHER, JOHANNES;UENVEREN, ERCAN;MROSS, STEFAN;PERNICE, HOLGER;PREDIKANT, PETER, M.;SCHWARZE, THOMAS;FISCHER, REINER |
发明人 |
SOMMER, CHRISTOPH;DIANA, OLIVIERO;EICHER, JOHANNES;UENVEREN, ERCAN;MROSS, STEFAN;PERNICE, HOLGER;PREDIKANT, PETER, M.;SCHWARZE, THOMAS;FISCHER, REINER |