发明名称 EXPOSURE APPARATUS, LIQUID CRYSTAL DISPLAY DEVICE AND METHOD FOR MANUFACTURING SAME
摘要 <p>The present invention provides: an exposure apparatus which is capable of suppressing the formation of seams on a display screen even in cases where the alignment is carried out by scanning exposure; a liquid crystal display device; and a method for manufacturing the liquid crystal display device. The present invention is an exposure apparatus which exposes an optical alignment film, while relatively moving a substrate, on the surface of which the optical alignment film is provided, with respect to exposure light. The exposure apparatus performs a first exposure, in which a first portion and a second portion of the optical alignment film are exposed, and a second exposure, in which a third portion of the optical alignment film is exposed and the second portion thereof is exposed again. The second portion lies between the first portion and the third portion. The first exposure is carried out so that the irradiance in the second portion is lower than the irradiance in the first portion, and the second exposure is carried out so that the irradiance in the second portion is lower than the irradiance in the third portion. The total of the irradiance in the second portion by the first exposure and the irradiance in the second portion by the second exposure is set to be lower than the irradiance in the first portion and the irradiance in the third portion.</p>
申请公布号 WO2012102104(A1) 申请公布日期 2012.08.02
申请号 WO2012JP50662 申请日期 2012.01.16
申请人 SHARP KABUSHIKI KAISHA;INOUE IICHIRO;MIYACHI KOICHI 发明人 INOUE IICHIRO;MIYACHI KOICHI
分类号 G02F1/1337 主分类号 G02F1/1337
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