| 摘要 |
<P>PROBLEM TO BE SOLVED: To produce a resist pattern with excellent CD uniformity (CDU). <P>SOLUTION: The present invention presents a composition containing a resin (X) having a structural unit expressed by formulae (aa), (ab) and an acid generator (B). In the formulae, A<SP POS="POST">aa1</SP>represents a group such as an alkane-diyl group optionally having a substituent; R<SP POS="POST">aa2</SP>represents an aliphatic hydrocarbon group; and R<SP POS="POST">ab2</SP>represents an aromatic hydrocarbon group. <P>COPYRIGHT: (C)2012,JPO&INPIT |
