| 摘要 |
<P>PROBLEM TO BE SOLVED: To shorten the takt of an exposure process by shortening the scanning distance of a light beam scanning the surface of a body to be exposed. <P>SOLUTION: An exposure device includes a pattern generator 6 which applies intensity modulation to a plurality of laser beams lined up in parallel at a fixed arrangement pitch in a direction crossing the conveyance direction of the body to be exposed 4 conveyed in a fixed direction at a fixed speed and emits the plurality of laser beams, a fθlens 7 which condenses the plurality of laser beams emitted from the pattern generator 6 on the body to be exposed 4, in such a manner that the plurality of laser beams are arranged side by side at a constant interval, and an acoustic optical element 8 which diffracts the plurality of laser beams emitted from the fθlens 7 in the direction crossing the conveyance direction of the body to be exposed 4, to reciprocatively scan a region between the laser beams being adjacent to each other simultaneously. The acoustic optical element 8 is disposed in such a state that the axis of the laser beam in a diffraction direction is rotated around an optical axis only by a fixed angle in the direction orthogonal to the conveyance direction of the body to be exposed 4, and a light shielding mask 22 for shielding zero-order diffraction light of the plurality of laser beams is provided on the light emission side of the acoustic optical element 8. <P>COPYRIGHT: (C)2012,JPO&INPIT |
