| 发明名称 |
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, PERMANENT MASK RESIST, AND PROCESS FOR PRODUCTION OF PERMANENT MASK RESIST |
| 摘要 |
<p>A photosensitive resin composition comprising a polyurethane resin having an ethylenically unsaturated bond and a carboxyl group, a phosphorous-containing polyester compound, a phosphinic acid salt, and a photopolymerization initiator.</p> |
| 申请公布号 |
WO2012102310(A1) |
申请公布日期 |
2012.08.02 |
| 申请号 |
WO2012JP51566 |
申请日期 |
2012.01.25 |
| 申请人 |
HITACHI CHEMICAL COMPANY, LTD.;ITAGAKI SHUUICHI;YOSHIDA TETSUYA;OOTOMO SATOSHI;OZAWA KYOUKO;FUJII TETSUFUMI |
发明人 |
ITAGAKI SHUUICHI;YOSHIDA TETSUYA;OOTOMO SATOSHI;OZAWA KYOUKO;FUJII TETSUFUMI |
| 分类号 |
G03F7/027;C07F9/30;C08F290/06;G03F7/004;H05K3/28 |
主分类号 |
G03F7/027 |
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