| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a deposition method and a deposition apparatus, with which thermal degradation of a polymer is suppressed and deposition is suitably achieved on a surface of the polymer. <P>SOLUTION: Gaseous ozone which is an oxidizing agent and TEOS which is a raw material for an oxide are supplied to a supercritical fluid, and SiO<SB POS="POST">2</SB>which is the oxide is generated by heating a structure 1 and a periphery thereof at a temperature of 200°C, and an SiO<SB POS="POST">2</SB>layer which is an oxide layer 5 is formed on an entire surface of an inner wall of a microchannel 3 of the structure 1 (that is, on a surface of a PDMS membrane 9 which is the polymer) with this SiO<SB POS="POST">2</SB>. Thereby, the oxide layer 5 is formed at a temperature lower than that in a conventional method, and as a result, a remarkable effect of not causing a problem such as degradation of the polymer is achieved. Moreover, because the oxide layer 5 is formed so as to cover the polymer surface without leaving any gap, there is also an advantage that hydrophilicity and gas permeation proofness thereof can be enhanced. <P>COPYRIGHT: (C)2012,JPO&INPIT |
