| 摘要 |
A negative-tone photo patternable coating composition containing: (1) at least one silicone or organic-inorganic hybrid resin with acid labile alkoxysilane groups which can be thermally decomposed into silanol groups at 80-160° C. in the presence of a catalytic amount of strong acid; (2) optionally, an organic/polymer with two or more trialkoxysilyl, alkyldialkoxysilyl, or dialkylalkoxysilyl functional groups; (3) a photoacid generator; (4) an acid quencher; (5) a flow control agent; and (6) at least one organic solvent. Methods of preparing the silicones and/or organic-inorganic hybrids and procedures of processing the photo patternable compositions are described. |
