| 摘要 |
<P>PROBLEM TO BE SOLVED: To decompose and remove carbon contamination adhering to the surface of a mask or an optical system in an EUV exposure apparatus without causing any damage on the mask or optical system. <P>SOLUTION: A cleaning device 40 comprises a processing chamber 43 which houses a multilayer film mirror 41 to the surface of which a carbon contamination 44 adheres. On the upper surface of the processing chamber 43, a light irradiation device 46 equipped with a mercury lamp 45 is installed, and the interior of the processing chamber 43 is irradiated with deep ultraviolet light having a wavelength of 254 nm emitted from the mercury lamp 45. Oxygen gas is introduced from an oxygen supply source 51 into the processing chamber 43, and ethylene gas is introduced from an unsaturated hydrocarbon supply source 52 into the processing chamber 43. When the oxygen gas and ethylene gas introduced into the processing chamber 43 are irradiated with the deep ultraviolet light, ions or radicals produced from these gases decompose the carbon contamination 44. <P>COPYRIGHT: (C)2012,JPO&INPIT |
