发明名称 METHOD FOR PRODUCTION OF METAL COPPER FILM, AND PRINTING METAL COPPER PATTERN
摘要 <P>PROBLEM TO BE SOLVED: To provide a treatment method for reducing to a deep portion, a printable and formable copper-based particle deposition layer having good adhesiveness to a substrate, low volume resistivity without a substrate damage; and to provide a method for producing a metal copper film preventing copper precipitation outside a printing/coating part, and also a printing metal copper pattern. <P>SOLUTION: The method for production of the metal copper film includes treating a copper-based particle deposition layer formed on the substrate and including particles comprising copper oxide with a gas mixture of gaseous formic acid and at least one organic solvent selected from gaseous monovalent alcohol, ester and ketone at 120&deg;C or higher. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012144755(A) 申请公布日期 2012.08.02
申请号 JP20110001930 申请日期 2011.01.07
申请人 HITACHI CHEMICAL CO LTD 发明人 NODO TAKAAKI;KAMISHIRO YASUSHI;NAKAKO TAKEO;INADA MAKI;KURODA KYOKO;YAMAMOTO KAZUNORI
分类号 C23C20/04;H01B5/14;H01B13/00;H01L21/28;H01L21/288;H01L21/3205;H01L21/768;H01L23/532 主分类号 C23C20/04
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