| 摘要 |
<P>PROBLEM TO BE SOLVED: To restrain particles generated when a processed substrate and a support substrate are separated by an exfoliation process from spreading to the outside of an exfoliation apparatus. <P>SOLUTION: An exfoliation system 1 includes a carry-in/carry-out station 2 which carries a wafer to be processed W, a support wafer S or a polymerization wafer T in and out of place, an exfoliation processing station 3 which executes prescribed processing on the wafer to be processed W, the support wafer S and the polymerization wafer T, and a transport station 7 installed between the carry-in/carry-out station 2 and the exfoliation processing station 3. The exfoliation processing station 3 includes an exfoliation apparatus 30 which exfoliates the polymerization wafer T, a first cleaning device 31 and a second cleaning device 33. The internal pressure of the transport station 7 is a positive pressure with respect to the internal pressure of the exfoliation apparatus 30, the internal pressure of the first cleaning device 31 and the internal pressure of the second cleaning device 33. <P>COPYRIGHT: (C)2012,JPO&INPIT |
