| 摘要 |
<p>Provided is a light irradiation device for crystallizing an amorphous silicon film inexpensively with no unevenness without using an eximer laser as an optical source. The light irradiation device (100) comprises a plurality of optical sources (14) and a plate-shaped prism (20) for condensing light emitted from the optical sources (14) and casting the light toward an irradiation target object in the form of light rays. Each of the optical sources (14) comprises a light emitting unit (10) and an elliptical mirror (12) for reflecting light emitted from the light emitting unit (10). The light emitting unit (10) is disposed at or close to the first focal point of the elliptical mirror (12). An incident surface (22) of the prism (20) is placed at or close to the second focal point of the elliptical mirror (12).</p> |
