DRESSING APPARATUS AND POLISHING APPARATUS

摘要

A dressing apparatus dresses a polishing surface of a polishing table used for polishing a workpiece such as a semiconductor wafer in a polishing apparatus. The dressing apparatus comprises a dresser body ( 31 ) connected to a dresser drive shaft ( 23 ) which is vertically movable, a dresser plate ( 32 ) which is vertically movable with respect to the dresser body ( 31 ), and a dressing member ( 22 ) held by the dresser plate ( 32 ) for dressing the polishing surface ( 1 a).