| 摘要 |
Method and apparatus for manufacturing a barrier layer on a substrate (1; 1a, 1b). An inorganic oxide layer (11) having a pore volume between 0.3 and 10 vol. % is provided on the substrate (1; 1a, 1b). Subsequently the substrate (1; 1a, 1b) with the inorganic oxide layer (11) is treated in an atmospheric glow discharge plasma to form a sealing layer (12), the plasma being generated by at least two electrodes (2, 3) in a treatment space (5) formed between the at least two electrodes (2, 3). The treatment space (5) comprises in operation a mixture of a gas comprising oxygen and precursor material in an amount between 2 and 50 ppm. A local deposition rate is controlled at 5 nm/sec or lower, using a power density of 10 W/cm2 or higher in the treatment space (5). |
