发明名称 |
METHOD FOR FORMING TRANSPARENT CONDUCTIVE FILM |
摘要 |
A method for forming a transparent conductive film forms the transparent conductive film containing ZnO as a basic element on a substrate by a sputtering which is performed by applying a sputtering voltage to a target made of a material to form the transparent conductive film and generating a horizontal magnetic field over a surface of the target. The sputtering is performed by setting the sputtering voltage to 340 V or less. |
申请公布号 |
EP2194157(A4) |
申请公布日期 |
2012.08.01 |
申请号 |
EP20080828619 |
申请日期 |
2008.08.20 |
申请人 |
ULVAC, INC. |
发明人 |
TAKAHASHI, HIROHISA;ISHIBASHI, SATORU;SUGIURA, ISAO;TAKASAWA, SATORU |
分类号 |
H01L31/18;C23C14/08;C23C14/35 |
主分类号 |
H01L31/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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