发明名称 Method for growing mono-crystalline nanostructures and use thereof in semiconductor device fabrication
摘要 <p>A method is provided for growing mono-crystalline nanostructures onto a substrate. The method comprises at least the steps of first providing a pattern (2) onto a main surface of the substrate (1) wherein said pattern (2) has openings extending to the surface of the substrate (1), providing a metal (3) into the openings of the pattern (2) on the exposed main surface, at least partly filling the opening with amorphous material (4), and then annealing the substrate at temperatures between 300ºC and 1000ºC thereby transforming the amorphous material (4) into a mono-crystalline material (5) by metal mediated crystallization to form the mono-crystalline nanostructure.</p>
申请公布号 EP2138609(B1) 申请公布日期 2012.08.01
申请号 EP20090075275 申请日期 2009.06.24
申请人 IMEC VZW 发明人 VEREECKEN, PHILIPPE M.
分类号 H01L29/06;B82Y10/00;B82Y30/00 主分类号 H01L29/06
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