SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE PROCESSING METHOD

摘要

PURPOSE: A substrate processing apparatus and a method thereof are provided to maximize a cleaning effect of a processing chamber by minimizing the loss of radical energy from cleaning gas. CONSTITUTION: A processing chamber(110) forms a sealed process space(S). The processing chamber includes a chamber body(112) and an upper lid(111) attachably and detachably combined with the chamber body to be. A gas supply part(150) supplies gas to the process space. The gas supply part includes a first diffusion space(DA1) and a second diffusion space(DA2). A substrate support part(130) is installed in the processing chamber and supports a substrate(10).