发明名称 |
Exposure method, exposure apparatus, and method for producing device |
摘要 |
A liquid immersion photolithography system has an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system that focuses the electromagnetic radiation on the substrate. A liquid supply system provides liquid flow between the projection optical system and the substrate. In addition, a plurality of nozzles are arranged so as to provide a substantially uniform velocity distribution of the liquid flow between the substrate and the projection optical system.
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申请公布号 |
US8233133(B2) |
申请公布日期 |
2012.07.31 |
申请号 |
US20050312478 |
申请日期 |
2005.12.21 |
申请人 |
HIRUKAWA SHIGERU;NIKON CORPORATION |
发明人 |
HIRUKAWA SHIGERU |
分类号 |
G03B27/52;G03B27/42;G03B27/58;G03F7/20 |
主分类号 |
G03B27/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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