发明名称 Semiconductor structure having varactor with parallel DC path adjacent thereto
摘要 A semiconductor structure includes a semiconductor substrate having a first region of a first polarity and a second region of a second polarity adjacent to the first region; and a first terminal including: a first deep trench located in the first region, a first node dielectric abutting all but an upper portion of sidewalls and a bottom of the first deep trench; a first conductive inner electrode inside the first node dielectric and electrically insulated from the first region by the first node dielectric; and a first electrical contact electrically coupling the first conductive inner electrode to the first region.
申请公布号 US8232624(B2) 申请公布日期 2012.07.31
申请号 US20090558839 申请日期 2009.09.14
申请人 FRIED DAVID M.;NOWAK JOSEPH E.;INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 FRIED DAVID M.;NOWAK JOSEPH E.
分类号 H01L29/93 主分类号 H01L29/93
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