发明名称 |
Semiconductor structure having varactor with parallel DC path adjacent thereto |
摘要 |
A semiconductor structure includes a semiconductor substrate having a first region of a first polarity and a second region of a second polarity adjacent to the first region; and a first terminal including: a first deep trench located in the first region, a first node dielectric abutting all but an upper portion of sidewalls and a bottom of the first deep trench; a first conductive inner electrode inside the first node dielectric and electrically insulated from the first region by the first node dielectric; and a first electrical contact electrically coupling the first conductive inner electrode to the first region. |
申请公布号 |
US8232624(B2) |
申请公布日期 |
2012.07.31 |
申请号 |
US20090558839 |
申请日期 |
2009.09.14 |
申请人 |
FRIED DAVID M.;NOWAK JOSEPH E.;INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
FRIED DAVID M.;NOWAK JOSEPH E. |
分类号 |
H01L29/93 |
主分类号 |
H01L29/93 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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