| 摘要 |
PURPOSE: A thermal processing furnace and a liner for the same are provided to prevent contaminants from being diffused from a furnace opening portion to wafers by arranging a reverse-diffusion preventing body between the furnace opening portion and the reaction chamber. CONSTITUTION: An outer reaction tube(30) includes a central axis(L). An inner reaction tube(40) receives a wafer boat(26) receiving a plurality of substrates(27). The inner reaction tube is arranged in the outer reaction tube substantially having a common axis. A flow deflector(50) is projected from each wall of reaction tubes within a gas passage(20). The flow deflector includes one or more baffles(52).
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