| 摘要 |
<p>A composition for etching of a ruthenium-basedmetal, in which there are added and mixed at least a 5 bromine-containing compound, an oxidizing agent, a basic compound and water, wherein the amount of bromine-containing compound added is 2-25 mass%, as bromine, and the amount of oxidizing agent added is 0.1-12 mass%, with respect to the total mass, and the pH is at least 10 and 10 less than 12. It is possible to accomplish efficient etching of ruthenium-based metals.</p> |
