发明名称 |
OXIDE SEMICONDUCTOR ELEMENT AND SEMICONDUCTOR DEVICE |
摘要 |
<p>PURPOSE: An oxide semiconductor device and a semiconductor apparatus are provided to improve mobility even if light is irradiated by using an oxide semiconductor having crystallizability on a semiconductor layer. CONSTITUTION: An oxide semiconductor layer(708) is formed on an insulating surface. A gate insulating layer(112) is formed on the oxide semiconductor layer. A gate electrode(114) is overlapped with the oxide semiconductor layer by interposing the gate insulating layer. The oxide semiconductor layer has a laminating structure of including a first oxide semiconductor film and a second oxide semiconductor film. The second oxide semiconductor film is inserted between the gate insulating layer and the first oxide semiconductor film. A band gap value of the first oxide semiconductor film is smaller than the band gap value of the second oxide semiconductor film.</p> |
申请公布号 |
KR20120084678(A) |
申请公布日期 |
2012.07.30 |
申请号 |
KR20120006034 |
申请日期 |
2012.01.19 |
申请人 |
SEMICONDUCTOR ENERGY LABORATORY CO., LTD. |
发明人 |
KOEZUKA JUNICHI |
分类号 |
H01L29/786;H01L21/336 |
主分类号 |
H01L29/786 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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