发明名称 OXIDE SEMICONDUCTOR ELEMENT AND SEMICONDUCTOR DEVICE
摘要 <p>PURPOSE: An oxide semiconductor device and a semiconductor apparatus are provided to improve mobility even if light is irradiated by using an oxide semiconductor having crystallizability on a semiconductor layer. CONSTITUTION: An oxide semiconductor layer(708) is formed on an insulating surface. A gate insulating layer(112) is formed on the oxide semiconductor layer. A gate electrode(114) is overlapped with the oxide semiconductor layer by interposing the gate insulating layer. The oxide semiconductor layer has a laminating structure of including a first oxide semiconductor film and a second oxide semiconductor film. The second oxide semiconductor film is inserted between the gate insulating layer and the first oxide semiconductor film. A band gap value of the first oxide semiconductor film is smaller than the band gap value of the second oxide semiconductor film.</p>
申请公布号 KR20120084678(A) 申请公布日期 2012.07.30
申请号 KR20120006034 申请日期 2012.01.19
申请人 SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 KOEZUKA JUNICHI
分类号 H01L29/786;H01L21/336 主分类号 H01L29/786
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