发明名称 METHOD OF USING A MASK TO PROVIDE A PATTERNED SUBSTRATE
摘要 <p>A method of producing substrates having a patterned mask layer with fine features such as repeating stripes. The method including the steps of forming a substrate having a transfer layer with a predetermined pattern on a first major surface of the substrate; providing the substrate having the transfer layer on the first major surface; providing a structured tool having a body and a plurality of contact portions, the contact portions having a Young's Modulus between about 0.5Gpa to about 30 Gpa; heating either the structured tool or the substrate; contacting the transfer layer with the structured tool; cooling the transfer layer; and withdrawing the structured tool from the transfer layer such that portions of the transfer layer separate with the structured tool leaving openings in the transfer layer that extend all the way through the transfer layer to the substrate forming the transfer layer with the predetermined pattern.</p>
申请公布号 SG181954(A1) 申请公布日期 2012.07.30
申请号 SG20120047437 申请日期 2010.12.20
申请人 3M INNOVATIVE PROPERTIES COMPANY 发明人 STAY, MATTHEW, S.;PEKUROVSKY, MIKHAIL, L.
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