| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a liquid processing apparatus and a liquid processing method which prevent a cleaning liquid accumulated in an accumulation part in a cleaning part from evaporating and also prevent the atmosphere of the evaporated cleaning liquid from entering into a processing chamber when a substrate is carried in or carried out to/from the processing chamber and a cup outer peripheral cylinder is in a lower position. <P>SOLUTION: A cleaning part 52, which has an accumulation part 52a for accumulating a cleaning liquid and a structure that allows a cup outer peripheral cylinder 50 to be immersed in the cleaning liquid accumulated in the accumulation part 52a when the cup outer peripheral cylinder 50 is in a lower position, is provided in a liquid processing apparatus 10. A lid 50c, which covers the cleaning liquid accumulated in the accumulation part 52a when the cup outer peripheral cylinder 50 is in the lower position, is provided at an upper end of the cup outer peripheral cylinder 50. <P>COPYRIGHT: (C)2012,JPO&INPIT |
