发明名称 |
PARALLEL MULTI WAFER AXIAL SPIN CLEAN PROCESSING USING SPIN CASSETTE INSIDE MOVABLE PROCESS CHAMBER |
摘要 |
A system and method concurrently processes multiple wafers. A cassette structure includes multiple chucks and a drive spool for supporting and rotating the chucks. Each chuck holds a wafer in position while rotating. The cassette structure is loaded into a process chamber. Each chuck includes a self-locking mechanism that is activated by the centrifugal force generated from the rotation of the chuck. The self-locking mechanism centers and holds a wafer in position with respect to the chuck. A drive motor drives the drive spool, which causes the chucks to rotate. As the chucks are being rotated, a dispensing assembly delivers a processing chemical to the wafers.
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申请公布号 |
US2012189421(A1) |
申请公布日期 |
2012.07.26 |
申请号 |
US201113011052 |
申请日期 |
2011.01.21 |
申请人 |
BRAR AMULDEEP S.;LEE NAMPYO;HAN WOOSUNG;SAMSUNG AUSTIN SEMICONDUCTOR, L.P. |
发明人 |
BRAR AMULDEEP S.;LEE NAMPYO;HAN WOOSUNG |
分类号 |
H01L21/687;B23B31/14;B23Q1/64 |
主分类号 |
H01L21/687 |
代理机构 |
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代理人 |
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