发明名称 PARALLEL MULTI WAFER AXIAL SPIN CLEAN PROCESSING USING SPIN CASSETTE INSIDE MOVABLE PROCESS CHAMBER
摘要 A system and method concurrently processes multiple wafers. A cassette structure includes multiple chucks and a drive spool for supporting and rotating the chucks. Each chuck holds a wafer in position while rotating. The cassette structure is loaded into a process chamber. Each chuck includes a self-locking mechanism that is activated by the centrifugal force generated from the rotation of the chuck. The self-locking mechanism centers and holds a wafer in position with respect to the chuck. A drive motor drives the drive spool, which causes the chucks to rotate. As the chucks are being rotated, a dispensing assembly delivers a processing chemical to the wafers.
申请公布号 US2012189421(A1) 申请公布日期 2012.07.26
申请号 US201113011052 申请日期 2011.01.21
申请人 BRAR AMULDEEP S.;LEE NAMPYO;HAN WOOSUNG;SAMSUNG AUSTIN SEMICONDUCTOR, L.P. 发明人 BRAR AMULDEEP S.;LEE NAMPYO;HAN WOOSUNG
分类号 H01L21/687;B23B31/14;B23Q1/64 主分类号 H01L21/687
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