发明名称 |
LIQUID TREATMENT APPARATUS AND METHOD |
摘要 |
A liquid treatment apparatus includes a substrate retaining unit, a rotational driving unit configured to rotate the substrate retaining unit; and a nozzle disposed below a lower surface of the substrate, the nozzle having first ejection ports provided to eject a chemical liquid and second ejection ports provided to eject a rinsing fluid towards the lower surface of the substrate. The nozzle comprises a first portion and a second portion each extending from a position opposing to a peripheral portion of the substrate towards a position opposing to a central portion of the substrate. At least part of the first ejection ports are arranged in the first portion. At least part of the second ejection ports are arranged in the second portion. The first portion and the second portion are arranged to form a V-shaped figure. |
申请公布号 |
US2012186744(A1) |
申请公布日期 |
2012.07.26 |
申请号 |
US201213355877 |
申请日期 |
2012.01.23 |
申请人 |
HIGASHIJIMA JIRO;ITOH NORIHIRO;TOKYO ELECTRON LIMITED |
发明人 |
HIGASHIJIMA JIRO;ITOH NORIHIRO |
分类号 |
C23F1/08;B08B3/02;B08B3/08 |
主分类号 |
C23F1/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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